| 单词 | etching |
| 释义 | etching [英 [?et???] 美 [??t???] ] etching的意思、解释 复数形式：etchings; etching 基本解释 名词蚀刻版画 动词用针和酸类在金属板上蚀刻（图画等）( etch的现在分词 ); （感情）明显地表露在（脸上）; （脸上）明显流露出（感情）; 铭刻在心里/记忆里/脑海里 etching etching 相关例句 名词 1. His etchings and drawings never went out of fashion. 他的蚀刻画和素描从不过时。 2. That is a beautiful etching of a bird. 那是一只鸟的漂亮的蚀刻画。 etching 网络解释 1. 腐蚀：(6)腐蚀 (etching) 经过上述工序后,以复制到光刻胶上的集成电路的图形作为掩模,对下层的材料进行腐蚀. 腐蚀技术是利用化学腐蚀法把材料的某一部分去除的技术. 腐蚀技术分为两大类:湿法腐蚀-进行腐蚀的化学物质是溶液; 2. etching的近义词 2. 蚀刻术：之后,利用蚀刻术(Etching)将RFID标签之天线以螺旋方式盘绕于圆环铜片上,再将此元件放置于附有圆孔之塑胶盘上;其次,再将此装有RFID标签天线之塑胶盘放置于尚未凝结之混凝土试体顶端. 3. etching的反义词 3. 蚀刻法：1.先以溅镀法(sputter)在苏打石玻璃(soda line glass)制作Al等膜层,再用蚀刻法(etching)制作图样(pattern). 上述第1与第4项之流程系使用现有的成膜技术与材料;第2与第3项则为松下公司开发的多孔化PPS技术. etching 双语例句 1. etching 1. An infrared thermalimage method which is used to study the wet etching process of semiconductor is proposed. 提出了一种研究半导体湿法腐蚀进程的红外热像法。 2. At the same time, the preparation and micro-pattern etching techniques of PZT thin films are investigated by experiment. 对PZT压电薄膜的制备和微细图形化进行了较为详细的实验研究，最后成功地制备出硅基PZT压电薄膜微传感器样品。 3. They are in a normal lithography processing steps is completed, using chemical etching method in place of the commonly used dry etching process, which quickly transferred to the required micro-pattern on the porous anodic aluminum oxide film. 他们在正常的光刻加工步骤完成后，利用化学刻蚀方法代替通常采用的干法刻蚀工艺，从而快速地将所需的微观图案转移到多孔阳极氧化铝片上。 4. etching的反义词 4. In the process of the micro-pattern fabrication, we utilized technology of shallow etching process effectively, that succeeded in reducing the leaked electric currents between mesa and gates. 在样品制作过程中，我们利用浅式蚀刻的技术，成功地降低样品与闸极之间的漏电流。 5. Moreover, the micro-pattern etching of electrodes and PZT thin films have been investigated, and the fast and successful etchings have been actualized with new etchants and original methods. The technics and mechanism of anisotropic etching of monocrystalline silicon have been studied deeply, for example the influences of the concentration and temperature of tetramethyl ammonium hydroxide on the rate and effect of the anisotropic etching. 此外，结合PZT铁电薄膜热释电单元红外探测器的设计和制备，对电极和PZT铁电薄膜的微图形刻蚀工艺进行了研究，采用新的刻蚀液配方和具有独创性的方法，实现了对PZT铁电薄膜和上下电极快速、成功的刻蚀。 6. etching 6. These emitting electrodes are a result of etching process instead of acid pickling, and are hence even reliable. 这些发射极是刻出的，不是酸洗的，因此器件更可靠。 7. 7. Theoretically, the experimental formula of ion beam etching rate has been corrected, as a result the application field is extended. 内容简述如下：理论方面：修正了传统的离子束溅射刻蚀速率的经验公式，扩展了它的适用范围。 8. Etching of graphical elements on silicon wafer has been proceeded, and the influence of experimental parameters on etching is analysed. 研究了FIB刻蚀中束斑漂移的影响和套准的作用，并在硅片上对各种图形元素的刻蚀进行了尝试，研究了刻蚀条件对结果的影响。 9. etching什么意思 9. HgCdTe p + on n hetero junction material was grown by molecular beam epitaxy and in situ doping, and HgCdTe p + on n hetero junction infrared focal plane arrays were fabricated by the process of wet etching, side wall passivation, side wall matelization, indium bump fabrication and hybridization etc. 采用由分子束外延和原位掺杂技术生长的p+-on-n异质结材料，通过湿法腐蚀、台面钝化、台面金属化、铟柱制备和互连等工艺，得到了HgCdTe p+-on-n长波异质结焦平面器件。 10. The effects of etching condition on the pore shape and pore size were also investigated. 在蚀刻后的样品表面镀金属膜，对镀膜后样品的抗金属污染的绝缘性能进行了研究。 11. A Fe-Al2O3 composite plating deposit was obtained based on non-etching iron dichloride iron plating process with addition of Al2O3 inert particles in ferrous chloride single salt solution (ferrous chloride concentration of 300~400 g/L) with no need of etching technology. 以二氯化铁无刻蚀电镀工艺为基础，在氯化亚铁单盐(ρ=300~400g/L)中加入Al2O3惰性粒子，制备了 Fe–Al2O3复合镀层。 12. Laser etching were tested on a silicon workpiece both in air and under water. 在实验的基础上，研究了两种介质中准分子激光刻蚀S i的刻蚀孔的基本形貌和刻蚀速率，并对结果进行了对比分析。 13. etching什么意思 13. As well as rock painting and etching, Australian Aboriginals have a long tradition of making and decorating artefacts. 与岩画和蚀刻版画一样，澳洲土著拥有相当悠久的制造和装饰人工制品的传统。 14. Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on. 中心现有80多台各种微机电工艺设备，如AMS 200深硅等离子体刻蚀系统、ICP-2B刻蚀机、AWB04键合机、MA6/BA6 Karlsuss双面光刻机和键合机、POLI-400化学机械抛光机、WL2040铝丝压焊机、OPTI CAOT 22i喷涂胶机系统、ZSH406全自动划片机、DQ-500等离子去胶机、全自动清洗甩干机、AXTRON MOCVD金属有机物化学气相沉积系统、4470微控四管扩散炉、4371LPCVD低压化学沉积系统、OMICRON分子束外延系统、JS-3X100B磁控溅射台、PECVD-2E等离子淀积台、ZZSX500C电子束蒸发台、JC500-3/D磁控溅射镀膜机、石英管清洗机，以及多种常用测试仪器，如OLS1100激光共聚焦显微镜、DEKTAK-III台阶测量仪、D41-11A/ZN四探针电阻测试仪、Nikon L150金相显微镜等。 15. The key technologies in the fabrication process including the deep heavy p+ doping technology, low stress silicon nitride film technology and body silicon etching technology were studied. 针对电容式微传声器制备过程中的关键工艺，做了详实细致的研究工作，包括高浓度深硼扩散工艺研究、低应力氮化硅薄膜的生长研究和体硅腐蚀工艺的研究，在工艺方面为电容式微传声器的制备打下了基础。 16. Based on the observation of atomic force microscopy, the etching morphology of faces and sections with different crystallographic significance on α-quartz has been studied. The etching morphology on the natural crystal faces hexagonal prism faces (1010 and 01(average10, rhombohedron positive form face 10(average11, rhombohedron negative form face 01(average11 and the sections between any of the two crystal faces has been observed. It is shown that the etching pit on the same simple form has the same shape, while the orientation of the etching pits can be different. Different simple forms have different shapes of etching pits and the shapes of etching pits on positive form and negative form of the same simple form are also different. 通过对α-石英自然晶面六方柱面10(平均值10和01(平均值10、菱面体正形面10(平均值11与菱面体负形面01(平均值11、以及介于上述自然晶面之间的切面进行腐蚀形貌的观察研究发现，石英晶体同种单形的晶面腐蚀坑形态相同，但方位可以有变化，不同单形的晶面腐蚀坑形态不同；同一单形的正形与负形腐蚀坑形状不同；蚀坑形态能够反映晶体的对称性。 17. etching 17. From this research, we prove the property of nano-scale etching with CPAWE and it can be used to fabricate a nano scale light emission device. 从本研究中，我们验证了间歇光辅助湿蚀刻的方式在奈米等级结构蚀刻的特性，并且确信其能应用在奈米级发光元件的制作上。 18. etching 18. You are also on this basis and frosting and etching. 还可在此基础上磨砂和蒙砂。 19. A hierarchical roughness was fabricated on H62 brass surface by chemical etching with a FeCl3-HCl-H2O solution. The roughness consisted of terrace-like sidestep and etch pit with average pore diameter varied from 6.2 to 8.3μm. 采用三氯化铁和盐酸溶液刻蚀H62黄铜表面，得到了一层由梯田状台阶结构及平均孔径为6.2-8.3μm的蚀坑组成的阶层结构。 20. The major comment in the paper is TFT-LCD slimming production about chemical etching, figure of product, reliability of product etc. 文章主要探讨了TFT-LCD薄板化生产，包括化学蚀刻方式、产品的性质，产品的可靠性项目等。 etching 词典解释 1. 蚀刻版画 An etching is a picture printed from a metal plate that has had a design cut into it with acid. etching 单语例句etching的近义词 1. The torch is of a curved surface form, with etching and anodizing being used during its production. 2. Rogers'team uses a special etching method that slices chips off the surface of a bulk silicon wafer. etching的翻译etching 英英释义 noun 1. making engraved or etched plates and printing designs from them Synonym: engraving 2. an etched plate made with the use of acid 3. an impression made from an etched plate |
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